Principal Engineer, RET Design

Micron Technology
Boise
Workplace: OnsiteFull timeFunction: Design (Product/UX/UI/Visual)Experience: 6+ yearsEducation: bachelorsSkills: ["Collaboration","Root-cause analysis","Technical problem-solving","Mentoring","Knowledge sharing"]

Develop and optimize Resolution Enhancement Techniques (RET) and Optical Proximity Correction (OPC) solutions to improve high-fidelity wafer patterning for advanced memory technologies. Lead lithography methodology and tapeout process improvements, diagnose patterning issues with root-cause analysis across R&D and manufacturing, and drive complex mask development projects. Collaborate across engineering teams and mentor engineers while applying tools and simulations to improve manufacturability, yield, and performance.

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Micron Technology
Micron Technology
2 weeks ago

Principal Engineer, RET Design

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Last checked: 3 hours agoStatus: Live

Job Summary

Develop and optimize Resolution Enhancement Techniques (RET) and Optical Proximity Correction (OPC) solutions to improve high-fidelity wafer patterning for advanced memory technologies. Lead lithography methodology and tapeout process improvements, diagnose patterning issues with root-cause analysis across R&D and manufacturing, and drive complex mask development projects. Collaborate across engineering teams and mentor engineers while applying tools and simulations to improve manufacturability, yield, and performance.
Location: Boise
Workplace: Onsite
Employment Type: Full time
Job Function: Design (Product/UX/UI/Visual)
Seniority: Sr. Manager level

Key Responsibilities

  • •Develop and implement RET and OPC solutions to improve pattern fidelity, manufacturability, and yield.
  • •Optimize lithography methodologies, software capabilities, and tapeout processes to improve performance and efficiency.
  • •Analyze patterning issues, identify root causes, and drive corrective actions across R&D and manufacturing environments.
  • •Lead complex mask development and lithography optimization projects while collaborating across engineering teams.
  • •Mentor engineers and promote technical best practices, knowledge sharing, and AI-enabled engineering approaches.

Pay and Benefits

Perks:Health InsuranceDentalVisionPaid LeavePaid Holidays

Key Requirements

  • •Bachelor’s degree in Electrical Engineering, Materials Science, Physics, Chemical Engineering, or a related technical field, plus 6+ years of experience in RET, OPC, lithography, or mask development.
  • •Experience developing and applying RET and OPC methodologies for semiconductor patterning challenges.
  • •Strong understanding of EUV lithography, optics, diffraction, resist behavior, and advanced patterning techniques.
  • •Experience with lithography simulation tools such as Sentaurus Litho, ProLith, or similar platforms.
  • •Ability to solve complex technical problems and collaborate across multidisciplinary engineering teams.
Experience:6+ yearsSemiconductorsEUV lithographyMask developmentOptical proximity correctionResolution enhancement techniques
Education:Bachelor's
Skills:CollaborationRoot-cause analysisTechnical problem-solvingMentoringKnowledge sharing
Tech Stack:RETOPCEUV lithographySentaurus LithoProLithSynopsysSiemensCadenceBrionPythonPerlTCLCC++

Company Brief

Micron Technology
Designs and manufactures semiconductor memory and storage solutions, including DRAM, NAND, and NOR flash, for computing, networking, mobile, and automotive markets worldwide.
Industry: Electronics Manufacturing
Company Size: Enterprise (1,001+ employees)
Revenue: USD 1B+
Growth: Public Company
Valuation: Public Company (Market Cap in USD)
Funding: IPO / Publicly Listed
Headquarters: Boise, United States
Founded: 1978
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