Senior Photo Process Engineer - Scanner Metrology

Micron Technology
Boise
Workplace: OnsiteFull timeFunction: Industrial, Process & Manufacturing EngineeringExperience: 5+ yearsSkills: ["Analytical thinking","Problem-solving","Data-driven approach","Meticulousness","Root cause analysis"]

Develop, optimize, and sustain scanner metrology solutions for advanced photolithography, enabling precise overlay measurement and alignment accuracy for next-generation DRAM manufacturing. Use KLA metrology systems and diffraction-based overlay techniques to monitor lithography performance, drive data-driven improvements in process control, and troubleshoot overlay/alignment issues with process, equipment, and integration teams. Perform root-cause analysis and improve SPC metrics.

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FursaFursa
Micron Technology
Micron Technology
5 days ago

Senior Photo Process Engineer - Scanner Metrology

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Source: Company careers pageValidated by: Fursa AI
Last checked: 7 hours agoStatus: Live

Job Summary

Develop, optimize, and sustain scanner metrology solutions for advanced photolithography, enabling precise overlay measurement and alignment accuracy for next-generation DRAM manufacturing. Use KLA metrology systems and diffraction-based overlay techniques to monitor lithography performance, drive data-driven improvements in process control, and troubleshoot overlay/alignment issues with process, equipment, and integration teams. Perform root-cause analysis and improve SPC metrics.
Location: Boise
Workplace: Onsite
Employment Type: Full time
Job Function: Industrial, Process & Manufacturing Engineering
Seniority: Mid level

Key Responsibilities

  • •Develop, optimize, and sustain scanner metrology solutions supporting advanced photolithography processes.
  • •Improve overlay performance, alignment accuracy, and process control using data-driven analysis.
  • •Use KLA metrology systems and diffraction-based overlay techniques to monitor and improve lithography performance.
  • •Partner with process, equipment, and integration teams to troubleshoot and resolve overlay and alignment issues.
  • •Perform root cause analysis on overlay errors, tool matching challenges, and process variability while improving SPC metrics.

Pay and Benefits

Perks:Health InsuranceDentalVisionPaid Time-offPaid HolidaysPaid LeaveEquity

Key Requirements

  • •5+ years of semiconductor experience in scanner metrology, overlay, or lithography metrology systems.
  • •Hands-on experience with KLA metrology tools and diffraction-based overlay measurement techniques.
  • •Strong understanding of alignment and overlay fundamentals in advanced photolithography.
  • •Experience troubleshooting overlay or metrology issues in a fab or manufacturing environment.
  • •Bachelor’s or Master’s degree in Engineering (or equivalent military experience, or AAS with 5+ years relevant experience).
Experience:5+ yearsSemiconductor manufacturingDRAMPhotolithographyFab operationsMetrologyOverlay measurement
Education:
Skills:Analytical thinkingProblem-solvingData-driven approachMeticulousnessRoot cause analysis
Tech Stack:KLAMetrology systemsDiffraction-based overlayOverlay measurementSPCPythonJMPMATLABScatterometryOptical overlayCD metrologyFault detectionData analytics

Company Brief

Micron Technology
Designs and manufactures semiconductor memory and storage solutions, including DRAM, NAND, and NOR flash, for computing, networking, mobile, and automotive markets worldwide.
Industry: Electronics Manufacturing
Company Size: Enterprise (1,001+ employees)
Revenue: USD 1B+
Growth: Public Company
Valuation: Public Company (Market Cap in USD)
Funding: IPO / Publicly Listed
Headquarters: Boise, United States
Founded: 1978
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