Process Engineer, Photomask Inspection

Micron Technology
Boise
Workplace: OnsiteFull timeFunction: Industrial, Process & Manufacturing EngineeringExperience: 2+ yearsEducation: bachelorsSkills: ["Communication","Mentoring","Technical leadership","Problem-solving","Collaboration"]

Start up, develop, optimize, and sustain photomask inspection processes for EUV reticle pattern inspection, including Automatic Defect Classification (ADC), defect avoidance, and inspection sensitivity tuning. Diagnose and resolve process-related manufacturing issues using structured problem-solving and statistical methods, while improving yield, cost, productivity, and KPIs. Collaborate across R&D, FEOL, HVM, and engineering teams to qualify new inspection processes and tools, and use AI tools to enhance efficiency.

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FursaFursa
Micron Technology
Micron Technology
1 week ago

Process Engineer, Photomask Inspection

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Source: Company careers pageValidated by: Fursa AI
Last checked: 6 days agoStatus: Live

Job Summary

Start up, develop, optimize, and sustain photomask inspection processes for EUV reticle pattern inspection, including Automatic Defect Classification (ADC), defect avoidance, and inspection sensitivity tuning. Diagnose and resolve process-related manufacturing issues using structured problem-solving and statistical methods, while improving yield, cost, productivity, and KPIs. Collaborate across R&D, FEOL, HVM, and engineering teams to qualify new inspection processes and tools, and use AI tools to enhance efficiency.
Location: Boise
Workplace: Onsite
Employment Type: Full time
Job Function: Industrial, Process & Manufacturing Engineering
Seniority: Mid level

Key Responsibilities

  • •Start up, develop, optimize, and sustain photomask inspection processes, including reticle pattern inspection, EUV inspection, ADC, defect avoidance, and inspection sensitivity tuning.
  • •Identify, diagnose, and resolve process-related manufacturing issues using systematic problem-solving methodologies such as Failure Analysis, FMEA, 8D, MBPS, RCA, and SPC/FDC.
  • •Lead and participate in continuous yield, cost, productivity, and automation/efficiency improvement initiatives to improve KPIs such as First Time Success Rate and nuisance/false alarm reduction.
  • •Monitor tool health and respond to trends or out-of-spec (OOS) process and equipment conditions; research and qualify new inspection processes, sensitivities, models, and baselines.
  • •Collaborate with R&D, FEOL, HVM, sustaining engineering, and inspection process/equipment teams; evaluate and qualify suppliers and provide technical leadership through mentoring and training.

Pay and Benefits

Perks:MedicalDentalVisionPaid LeavePaid Holidays

Key Requirements

  • •Bachelor’s degree or higher in Engineering, Physics, Optics, or Mathematics.
  • •2+ years of experience in reticle pattern inspection or wafer inspection (RDA).
  • •Experience optimizing inspection sensitivities to ensure defect detection and zero printing defects.
  • •Experience developing, tuning, and optimizing ADC (Automatic Defect Classification) systems and algorithms.
  • •Strong systematic problem-solving skills (e.g., MBPS, RCA) with excellent written and verbal communication.
Experience:2+ yearsSemiconductor manufacturingPhotomask inspectionWafer inspection
Education:Bachelor's
Skills:CommunicationMentoringTechnical leadershipProblem-solvingCollaboration
Tech Stack:EUVReticle pattern inspectionAutomatic Defect Classification (ADC)Failure AnalysisFMEA8DMBPSRCASPCFDCStatistical data analysisActinic imagesWPCPellicleHigh-NA lithographyAI tools

Company Brief

Micron Technology
Designs and manufactures semiconductor memory and storage solutions, including DRAM, NAND, and NOR flash, for computing, networking, mobile, and automotive markets worldwide.
Industry: Electronics Manufacturing
Company Size: Enterprise (1,001+ employees)
Revenue: USD 1B+
Growth: Public Company
Valuation: Public Company (Market Cap in USD)
Funding: IPO / Publicly Listed
Headquarters: Boise, United States
Founded: 1978
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