EUV Mask Technology FEOL RND Engineer

Micron Technology
Boise, Idaho
Workplace: OnsiteFull timeFunction: Healthcare (Clinical, Medical, Wellness)Experience: 2+ yearsEducation: high_schoolSkills: ["Data-driven","Collaborative","Hands-on","Technology roadmapping","Data-driven analysis"]

Develop next-generation AI-assisted EUV mask blank materials and processes (film stack design, deposition, etch, clean, and patterning), and advance High-NA EUV manufacturing readiness. Translate lithography requirements into robust, manufacturable mask solutions while collaborating with materials science, lithography, OPC, and FEOL process engineering teams. Use DOE and fundamental analysis to improve yield, reliability, and manufacturability, and help transition new technologies into FEOL process engineering.

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FursaFursa
Micron Technology
Micron Technology
4 weeks ago

EUV Mask Technology FEOL RND Engineer

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Source: Company careers pageValidated by: Fursa AI
Last checked: 57 minutes agoStatus: Live

Job Summary

Develop next-generation AI-assisted EUV mask blank materials and processes (film stack design, deposition, etch, clean, and patterning), and advance High-NA EUV manufacturing readiness. Translate lithography requirements into robust, manufacturable mask solutions while collaborating with materials science, lithography, OPC, and FEOL process engineering teams. Use DOE and fundamental analysis to improve yield, reliability, and manufacturability, and help transition new technologies into FEOL process engineering.
Location: Boise, Idaho
Workplace: Onsite
Employment Type: Full time
Job Function: Healthcare (Clinical, Medical, Wellness)
Seniority: Mid level

Key Responsibilities

  • •Develop AI-assisted EUV mask blank materials and processes, including film stack design, deposition, etch, clean, and patterning quality.
  • •Advance High-NA EUV readiness through material selection, mask design, stitching, lithography performance optimization, and lifetime improvement.
  • •Translate lithography requirements into manufacturable mask solutions in collaboration with OPC, design, and lithography teams.
  • •Conduct data-driven R&D using DOE and fundamental analysis to improve yield, reliability, and manufacturability.
  • •Collaborate with cross-functional engineering teams to transition new technologies into FEOL process engineering.

Pay and Benefits

Perks:Health InsuranceDentalVisionPaid Leave

Key Requirements

  • •MS or PhD in Materials Science, Physics, Chemistry, Chemical Engineering, or a related field.
  • •2+ years of experience in semiconductor manufacturing, process development, or equivalent academic research in semiconductor technologies.
  • •Strong background in BEOL or FEOL process control, mask process qualification, or high-volume semiconductor manufacturing.
  • •Deep understanding of lithography fundamentals, including EUV systems, mask-to-wafer correlation, and pattern transfer fidelity.
  • •Experience defining tool requirements, specifications, and roadmap strategy for semiconductor material, equipment, or processes.
Experience:2+ yearsSemiconductor manufacturingProcess developmentEUV lithographyAdvanced nodesHigh-volume semiconductor manufacturing
Education:High School in Materials Science, Physics, Chemistry, Chemical Engineering, or related field
Skills:Data-drivenCollaborativeHands-onTechnology roadmappingData-driven analysis
Tech Stack:AI assisted EUVEUV lithographyHigh-NA EUVMask materialsFilm stack designDepositionEtchCleanPatterning qualityMask designStitchingLithography performance optimizationLifetime improvementDOEOPCActinic mask inspectionDefect printability analysisMask repairFEOL process engineeringLithography simulation

Company Brief

Micron Technology
Designs and manufactures semiconductor memory and storage solutions, including DRAM, NAND, and NOR flash, for computing, networking, mobile, and automotive markets worldwide.
Industry: Electronics Manufacturing
Company Size: Enterprise (1,001+ employees)
Revenue: USD 1B+
Growth: Public Company
Valuation: Public Company (Market Cap in USD)
Funding: IPO / Publicly Listed
Headquarters: Boise, United States
Founded: 1978
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