EUV Mask BEOL R&D Engineer

Micron Technology
Boise
Workplace: OnsiteFull timeFunction: Research & Scientific (R&D)Experience: 2+ yearsSkills: ["Collaboration","Mentoring","Leadership","Technical exploration","Technology roadmapping"]

Develop EUV mask BEOL technologies for Micron’s High-NA EUV roadmap, owning high-visibility R&D programs from characterization to readiness for manufacturing. Work on actinic inspection, automated defect classification, printability assessment, metrology, and defect repair processes. Drive physics-based modeling and lithography simulation to correlate mask properties with wafer performance, define tool requirements, partner with suppliers, and transition results to BEOL process engineering teams.

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Micron Technology
Micron Technology
1 month ago

EUV Mask BEOL R&D Engineer

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Source: Company careers pageValidated by: Fursa AI
Last checked: 21 hours agoStatus: Live

Job Summary

Develop EUV mask BEOL technologies for Micron’s High-NA EUV roadmap, owning high-visibility R&D programs from characterization to readiness for manufacturing. Work on actinic inspection, automated defect classification, printability assessment, metrology, and defect repair processes. Drive physics-based modeling and lithography simulation to correlate mask properties with wafer performance, define tool requirements, partner with suppliers, and transition results to BEOL process engineering teams.
Location: Boise
Workplace: Onsite
Employment Type: Full time
Job Function: Research & Scientific (R&D)
Seniority: Mid level

Key Responsibilities

  • •Contribute to EUV mask BEOL characterization and quality enablement, including defect printability rules and imaging performance.
  • •Develop actinic inspection, automated defect classification, printability assessment, metrology, and defect repair processes.
  • •Run physics-based modeling and lithography simulation to correlate mask properties with wafer performance.
  • •Define tool capability requirements, lead early supplier engagement, and guide technology selection.
  • •Partner with engineers to transition developed technologies to BEOL process engineering teams.

Pay and Benefits

Perks:MedicalDentalVisionPaid LeavePaid Holidays

Key Requirements

  • •MS or PhD in Materials Science, Physics, Chemistry, Chemical engineering, or a related technical field.
  • •2+ years of experience in semiconductor manufacturing, process development, or equivalent academic research in semiconductor technologies.
  • •Strong understanding of lithography fundamentals, including EUV systems and pattern transfer fidelity.
  • •Experience with lithography simulation, OPC, or advanced mask design.
  • •Ability to lead complex R&D efforts and collaborate across fabs, suppliers, and vendors.
Experience:2+ yearsSemiconductor manufacturingEUV/High-NA lithographyMask technologySemiconductor process development
Education:
Skills:CollaborationMentoringLeadershipTechnical explorationTechnology roadmapping
Tech Stack:EUVHigh-NA EUVActinic inspectionAutomated defect classificationPrintability assessmentMetrologyDefect repairPhysics-based modelingLithography simulationTool capability requirementsOPCAdvanced mask designDefect printability rulesImaging performance

Company Brief

Micron Technology
Designs and manufactures semiconductor memory and storage solutions, including DRAM, NAND, and NOR flash, for computing, networking, mobile, and automotive markets worldwide.
Industry: Electronics Manufacturing
Company Size: Enterprise (1,001+ employees)
Revenue: USD 1B+
Growth: Public Company
Valuation: Public Company (Market Cap in USD)
Funding: IPO / Publicly Listed
Headquarters: Boise, United States
Founded: 1978
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